发明名称 PROCESS LIQUID SUPPLY SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide supply of process liquid at constant pressure or constant flow rate while keeping secondary pressure of secondary flow rate of a constant pressure valve constant without increasing delivery pressure of a pump higher than necessary one. <P>SOLUTION: In a process liquid supply system provided with: a process liquid tank 3 storing process liquid; a bellows pump 4 continuously delivering process liquid from the process liquid tank 3 to piping 2 connecting to a process liquid supply nozzle 36 supplying process liquid; and the constant pressure valve 5 positioned on a secondary side of the bellows pump 4 and inhibiting pulsation of liquid flow by the bellows pump 4, a gas supply source 7 supplying gas compensating pressure drop of pulsation of liquid flow by the bellows pump 4 is connected to the secondary side of the bellows pump 4 in the piping 2, and a filter 8 including a gas release part 8a discharging gas supplied in the piping 2 from the gas supply source 7 is provided. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008274841(A) 申请公布日期 2008.11.13
申请号 JP20070118865 申请日期 2007.04.27
申请人 TOKYO ELECTRON LTD 发明人 HARA KENICHI;TANAKA TAKASHI;IWASHITA MITSUAKI;TOSHIMA TAKAYUKI;ORII TAKEHIKO
分类号 F04B11/00;B05C11/10;F04B23/00;F04B53/06;G03F7/30;H01L21/027 主分类号 F04B11/00
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