| 摘要 |
This invention includes a first filter ( 27 ) connected between a susceptor ( 21 ) and ground and having a variable impedance, a sensor ( 28 ) for detecting an electrical signal based on the state of a plasma (P) generated in a process chamber ( 11 ), and a control means ( 36 ) for controlling the impedance of the first filter ( 27 ) on the basis of a detection result output from the sensor ( 28 ). Thus, a preferable plasma distribution to match the object of the plasma process can be realized.
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