| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new resist composition and a new resist pattern forming method. <P>SOLUTION: The resist composition comprises a base material component (A) of which the solubility in an alkali developer changes by the action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the acid generator component (B) comprises a compound (I) represented by general formula (I), wherein R<SP>1</SP>is an organic group other than a (meth)acryloyl group; R<SP>2</SP>is an alkylene group or a fluorinated alkylene group; R<SP>3</SP>is a substituted or unsubstituted aryl group; and R<SP>4</SP>is a halogenated alkyl group. <P>COPYRIGHT: (C)2009,JPO&INPIT |
