发明名称 Procédé de fabrication d'un élément de mémoire intégré
摘要 1,227,090. Magnetic storage devices. THOMSON-CSF. 24 July, 1969 [25 July, 1968], No. 37350/69. Heading H3B. In a method of making a magnetic storage device, Fig. 4, successive layers of copper 12, permalloy 1, and copper 13 are deposited on a layer of varnish on a glass substrate 10, the permalloy being electrodeposited as a toroidal element centred on a hole formed by photoengraving after vacuum deposition of layer 12. The substrate is removed by dissolving the varnish, and a gold conductor 2, Fig. 7, is formed electrolytically to pass through the hole, and then parts of the initial copper layers of Fig. 4 are etched down to the torroid so that the torroid may be secured to the gold conductor by insulating material 15. The remaining copper is then dissolved and replaced by an insulating layer 17 which enters the structure by capillary action. More than one gold conductor may pass through the hole, and devices of different speeds may be made according to the thickness of magnetic material used.
申请公布号 CH517988(A) 申请公布日期 1972.01.15
申请号 CH19690010460 申请日期 1969.07.09
申请人 THOMSON-CSF 发明人 CARBONEL,MICHEL
分类号 H01F10/06;(IPC1-7):G11C11/14 主分类号 H01F10/06
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