Lighting device for microlithographic projection exposure system, has optical element adjusting polarization conditions of radiations, where conditions are different from each other and radiations are deflected in different directions

摘要

The device (10) has a polarization influencing element (15) converting a linear polarization distribution into a tangential polarization distribution. A diffractive optical element (12) is positioned before the polarization influencing element along a light propagation direction. Light radiations of light beams passing through the diffractive optical element deflect in different deflection directions. The diffractive optical element adjusts polarization conditions of the light radiations of the light beam, where the polarization conditions are different from each other. An independent claim is also included for a method for manufacturing a micro-structured component microlithographically.