发明名称 |
NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To improve the luminance by forming a high-quality nitride semiconductor and reducing light absorption by a silicon substrate in a nitride semiconductor light-emitting element that uses the silicon substrate. <P>SOLUTION: The nitride semiconductor light-emitting element comprises a substrate 1 made of silicon; a mask film 2 which is formed on the principal plane of the substrate 1 and has a plurality of opening portions 2a; an n-type GaN layer 4 which is crystal-grown, laterally from each opening portion 2a on the mask film 2; and an active layer 5 and a p-type GaN layer 6, which are formed on the n-type GaN layer 4 and provide light emission. The reflectivity of the mask film 2 is larger than that of the substrate 1, at a light emission wavelength from the active layer 5. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008277430(A) |
申请公布日期 |
2008.11.13 |
申请号 |
JP20070117236 |
申请日期 |
2007.04.26 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
USUDA MANABU;TAKASE HIROSHI;SHIMIZU JUN;UEDA TETSUZO;UEDA DAISUKE |
分类号 |
H01L33/06;H01L33/10;H01L33/16;H01L33/32;H01L33/34;H01L33/38;H01L33/42;H01L33/44 |
主分类号 |
H01L33/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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