| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new resist composition and a new resist pattern forming method. <P>SOLUTION: The resist composition comprises a base material component (A) of which the solubility in an alkali developer changes by the action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the acid generator component (B) is a polymer using an α-(un)substituted acrylic ester having a specific sulfonyl oxime in a side chain as a constitutional unit. <P>COPYRIGHT: (C)2009,JPO&INPIT |
