| 发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of a liquid immersion lithographic apparatus. <P>SOLUTION: A cleaning fluid is introduced into a space between the projection system and the substrate table of the lithographic apparatus using the liquid supply system of the lithographic apparatus. Additionally or replacing above, a cleaning device is installed on the substrate table, or an ultrasonic emitter is provided for generating an ultrasonic liquid. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2008277854(A) |
申请公布日期 |
2008.11.13 |
| 申请号 |
JP20080161707 |
申请日期 |
2008.06.20 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
JANSEN HANS;BASELMANS JOHANNES JACOBUS MATHEUS;DONDERS SJOERD NICOLAAS LAMBERTUS;CHRISTIAAN ALEXANDER HOOGENDAM;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;STAVENGA MARCO KOERT;STREEFKERK BOB;HOEVEN JAN CORNELIS V D;GROUWSTRA CEDRIC D |
| 分类号 |
H01L21/027;G03F7/20;H01L21/683 |
主分类号 |
H01L21/027 |
| 代理机构 |
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