| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning device capable of irradiating an optical element with the suitable cumulative quantity of light without directly investigating a state where extraneous matter is deposited on the optical element, and to provide an exposure apparatus including the cleaning device. <P>SOLUTION: The cleaning device 150 cleans optical elements M1-M6 in an exposure apparatus 100 that exposes an object to be treated, using second light of which a wavelength is different from that of first light, by projecting, with the first light, the pattern of a mask 2 through the optical elements to the object 4 to be treated. The cleaning device includes a recording means 5 for recording information about an exposure history of the exposure apparatus and a generation means 8 for generating, on the basis of the information about the exposure history, information about the cumulative radiation quantity of the second light for each area within the range scheduled to be cleaned in each of the optical elements. <P>COPYRIGHT: (C)2009,JPO&INPIT |
