| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus for reducing defocus which may be caused by deformation on a pattern surface of an original plate for instance. <P>SOLUTION: The exposure apparatus including a projecting optical system for projecting light from the original plate to expose a substrate through the pattern surface of the original plate and the projecting optical system comprises a detection means for respectively detecting a plurality of positions on the pattern surface in the optical axis direction of the projecting optical system and a means for applying force to the original plate in a direction orthogonal to the pattern surface, wherein the force applying means is allowed to generate force so that the plurality of positions on the pattern surface which are detected by the detection means are included within a predetermined allowable range. <P>COPYRIGHT: (C)2009,JPO&INPIT |
