发明名称 Systems and Methods for a Thin Film Capacitor Having a Composite High-K Thin Film Stack
摘要 Systems and methods are provided for fabricating a thin film capacitor involving depositing an electrode layer of conductive material on top of a substrate material, depositing a first layer of ferroelectric material on top of the substrate material using a metal organic deposition or chemical solution deposition process, depositing a second layer of ferroelectric material on top of the first layer using a high temperature sputter process and depositing a metal interconnect layer to provide electric connections to layers of the capacitor.
申请公布号 US2008278887(A1) 申请公布日期 2008.11.13
申请号 US20080117099 申请日期 2008.05.08
申请人 ZELNER MARINA;CAPANU MIRCEA;NAGY SUSAN C 发明人 ZELNER MARINA;CAPANU MIRCEA;NAGY SUSAN C.
分类号 H01G4/06;H01G9/00 主分类号 H01G4/06
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