发明名称 MANUFACTURING METHOD OF MICRO-TRANSFORMER
摘要 PROBLEM TO BE SOLVED: To manufacture a micro-transformer using a mask material having a large selection ratio while improving throughput and preventing an insulating film between coils from cracking. SOLUTION: An insulating film 3 is deposited on the entire surface of a semiconductor substrate 1 where an impurity-diffused region 2. The insulating film 3 is partially removed to form a first opening portion 4 and a second opening portion 5. Then a primary coil 7 is formed having a center pad 8 in contact with the impurity-diffused region 2 through the first opening portion 4. Then a thin insulating film 10 is deposited on the primary coil 7. On the insulating film 10 on the primary coil side, an insulator material 12 forming a secondary coil 14 is stuck with an adhesive tap 17. In this case, the insulator material 12 is sized to cover neither a pad 9 connected to a center pad 8 of the primary coil 7 through the impurity-diffused region 2 nor an external-end pad 22 of the primary coil 7. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008277564(A) 申请公布日期 2008.11.13
申请号 JP20070119638 申请日期 2007.04.27
申请人 FUJI ELECTRIC DEVICE TECHNOLOGY CO LTD 发明人 IWATANI MASANOBU;HIRUTA REIKO;UENO KATSUNORI;MOCHIZUKI KUNIO
分类号 H01F41/04 主分类号 H01F41/04
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