发明名称 EMBEDDED DEPTH MEASURING METHOD FOR METAL FILM
摘要 PROBLEM TO BE SOLVED: To provide an embedding depth measuring method for a metal film for nondestructively, accurately and easily measuring the depth down to the metal film embedded in a translucent material from the surface of the translucent material. SOLUTION: A reflection spectrum of the translucent material with the metal film embedded is measured at a fixed incident angleθusing infrared light to obtain the reflection spectrum, and a period P(cm<SP>-1</SP>) of periodic interference fringe in a wave number region of 2500 cm<SP>-1</SP>or more of the obtained reflection spectrum is obtained. A refraction index of the translucent material is made n, and depth d(cm) to the metal film from the surface of the translucent material is obtained by d=1/(2P(n<SP>2</SP>-sin<SP>2</SP>θ)<SP>0.5</SP>). COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008275552(A) 申请公布日期 2008.11.13
申请号 JP20070122338 申请日期 2007.05.07
申请人 COVALENT MATERIALS CORP 发明人 SHIRAI HIROSHI;SUZUKI KENJI;SHIN TAIRA
分类号 G01B11/02;G01V3/12 主分类号 G01B11/02
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