| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a color filter substrate, by which the film thickness (height) of a columnar spacer to be a finished spacer can be formed accurately and a PS (photo spacer) can be manufactured, without reducing the rate of operation of a PS manufacturing device, and to provide a manufacturing apparatus of the color filter substrate. <P>SOLUTION: A black matrix 12b, a color filter 30, a layered spacer 41 and a transparent electrode 51 are formed on a transparent substrate 11 by a color filter forming means 110 and a transparent electrode forming means 120 for forming a color filter substrate 80 of a half way process. The film thickness of the layered spacer 41 of the color filter substrate 80 of the half way step is measured by a film thickness measuring means 130, the film thicknesses of the layered spacers 41 are stratified in each range by a layered spacer film thickness stratifying means 140, and manufacturing conditions are set by every range of the film thickness of the layered spacers 41 and PS by every range of the film thickness by a PS manufacturing means 150 is formed. <P>COPYRIGHT: (C)2009,JPO&INPIT |
