| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound suitable as an acid-generating agent for a resist composition, an acid-generating agent consisting of the compound, a resist composition containing the acid-generating agent and a method for producing a resist pattern. <P>SOLUTION: This compound useful as an acid-generating agent for a resist composition is expressed by general formula (1b-10) (wherein, R<SP>40</SP>is a halogen atom, especially a fluorine atom; R<SP>41</SP>to R<SP>43</SP>are each an alkyl group or the like; n<SB>0</SB>is 1-5; n<SB>1</SB>to n<SB>3</SB>are each 0 or the like; and X<SP>-</SP>is a univalent organic anion). <P>COPYRIGHT: (C)2009,JPO&INPIT |
