发明名称 MASK STAGE
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask stage that prevents deadweight bending of a mask in an aperture and which is capable of properly keeping the mask with flatness. <P>SOLUTION: A mask 20 is raised until the mask touches a lip seal 3, and the space enclosed by a stage base 11, a light-transmitting member 4, the mask 20 and the lip seal is evacuated. The mask 20 is pushed up by atmospheric pressure in contact with a fixed support 1, provided at three places and with a vertically displaceable support 2 provided at a plurality of places. The pressure at an aperture 11a is reduced, until the gravity bending of the mask 20 disappears, and the displaceable support 2 is fixed to prevent vertical displacement by an air lock mechanism 2d of the displaceable support 2. Vacuum suction sections 1b, 2i of the fixed support 1 and of the displaceable support 2 are evacuated and the mask 20 is chucked and held. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008276040(A) 申请公布日期 2008.11.13
申请号 JP20070121488 申请日期 2007.05.02
申请人 USHIO INC 发明人 TANAKA YONETA
分类号 G03F7/20 主分类号 G03F7/20
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