| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure equipment which can form an effective light source distribution having an effective light source topography of large outside σ or a minute topography with high precision while suppressing deficiency in quantity of light. <P>SOLUTION: The exposure equipment comprising an illumination optical system for illuminating a reticle by using a light beam from a light source, and a projection optical system for projecting the pattern of the reticle onto a substrate is further provided with a diffraction optical element for forming a light intensity distribution on the pupil surface of the illumination optical system, a shading member for partially adjusting the topography of the light intensity distribution, and a control section for inserting the shading member withdrawably into the pupil surface of the illumination optical system based on the topography of the light intensity distribution formed by the diffraction optical element. <P>COPYRIGHT: (C)2009,JPO&INPIT |
