| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device which forms a line-and-space with accuracy by preventing a pattern defect from being generated during formation of a pattern. SOLUTION: The semiconductor device has at least two transistor blocks having a plurality of transistors and a plurality of gates connected to the plural transistors each. The plural gates have open-loop shapes of a substantially U shape, and the plural gates to be arranged in the transistor blocks are arranged symmetrically, with each of opening portions of the open-loop shapes facing between the two transistor blocks which are adjacent. COPYRIGHT: (C)2009,JPO&INPIT
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