| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical supply method used for supplying a solution containing a persulfate to a chemical mechanical polishing process using slurry for quickly measuring and managing the active constituent amount of the persulfate, and a device. SOLUTION: The chemical supply device dissolves a powdered or solid persulfate in a solvent to attain a persulfate solution of a desired concentration and supplies it to the chemical mechanical polishing process using the slurry. In the chemical supply method and the device, the constituent concentration of the persulfate is obtained by measuring conductivity after dissolution, the decomposition rate of the persulfate is captured by measuring the change of pH thereafter, thus the concentration of the active persulfate constituent after decomposition is calculated and the lowering of oxidation power is managed. COPYRIGHT: (C)2009,JPO&INPIT
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