| 摘要 |
PROBLEM TO BE SOLVED: To provide a drawing device and a method reducing the displacement of drawing positions of beams caused by an eddy current. SOLUTION: The drawing device 100 has an electron gun 201 irradiating electron beams 200, a main deflecting system 214 deflecting the electron gun 200, an XY stage 105 placing a sample 101 and continuously moving it and an object lens 207 conducting focusing on the sample. The drawing device 100 further has a correction-quantity computing section 126 computing a quantity for correcting the positional displacement of the electron beams 200 on a sample surface on the basis of a first magnetic field resulting from the object lens 207 and a second magnetic field generated by the eddy current generated by the first magnetic field and the movement of a stage. The drawing device further has an offset section 128 computing the position of the correction correcting the positional displacement on the sample surface by using the quantity of the correction and a deflection control circuit 110 controlling the main deflecting system 214 so that charged-particle beams are deflected at the position of the correction. Accordingly, a positional correction of an amount of an influence of a magnetic field caused by the eddy current can be performed. COPYRIGHT: (C)2009,JPO&INPIT
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