发明名称 Apparatus and Method for Coating a Substrate
摘要 An apparatus for coating a substrate using physical vapour deposition, including a vacuum chamber wherein a coil is placed for keeping an amount of conductive material in levitation and for heating and evaporating that material, using a varying electric current in the coil. Isolating member are placed in the coil to isolate the coil from the levitated material. The isolating member is part of a container made of non-conductive material. The container has one or more openings for guiding evaporated conductive material to the substrate to be coated. A method for coating a substrate using physical vapour deposition is also presented.
申请公布号 US2008280066(A1) 申请公布日期 2008.11.13
申请号 US20060913580 申请日期 2006.04.27
申请人 CORUS TECHNOLOGY BV 发明人 SCHADE VAN WESTRUM JOHANNES ALPHONSUS FRANCISCUS MARIA;BAPTISTE LAURENT CHRISTOPHE BERNARD;GLEIJM GERARDUS
分类号 H05H1/24;C23C16/00 主分类号 H05H1/24
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