发明名称 MASK FOR VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a mask for vapor deposition withstanding the rise of temperature and capable of high precision masking when prescribed patterns or the like are vapor-deposited to the substrate to be vapor-deposited using a stock such as plastics, a glass substrate or the like with different thermal expansion coefficients. SOLUTION: Holding substrates 2 composed of various materials are pasted to a mask 1 in which various circuit patterns or the like are formed by adhesion or the other method, so as to be integrated; thus a high precision mask for vapor deposition stabilized to thermal expansion is composed. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008274373(A) 申请公布日期 2008.11.13
申请号 JP20070121474 申请日期 2007.05.02
申请人 OPTNICS PRECISION CO LTD 发明人 KINUTA KIYOSHIZU
分类号 C23C14/04;C23C14/24 主分类号 C23C14/04
代理机构 代理人
主权项
地址