发明名称 INTERCONNECTION FILM AND ELECTRODE FILM FOR FLAT PANEL DISPLAY USING THIN FILM TRANSISTOR (TFT) SUPERIOR IN ADHESIVENESS, AND SPUTTERING TARGET FOR FORMING THEM
摘要 PROBLEM TO BE SOLVED: To provide a copper alloy thin film for forming an interconnection and an electrode for flat panel display, using a thin film transistor (TFT) that is superior in adhesiveness, and to provide a sputtering target for forming the copper alloy thin film. SOLUTION: The interconnection and an electrode for flat panel display using a thin-film transistor having superior adhesiveness, formed by a copper alloy thin film having a composition containing oxygen by 0.4 to 6 atomic%, one or more of Ni, Co and Zn by 0.001 to 3 atomic% in total, and the rest consisting of Cu and unavoidable impurities, and is also relates to a sputtering target for forming interconnections and the electrode. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008277685(A) 申请公布日期 2008.11.13
申请号 JP20070122283 申请日期 2007.05.07
申请人 MITSUBISHI MATERIALS CORP 发明人 MORI AKIRA;CHO SHUHIN;MISHIMA TERUSHI
分类号 H01L21/3205;C23C14/34;H01L21/28;H01L21/285;H01L23/52;H01L29/786 主分类号 H01L21/3205
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