发明名称
摘要 In a method for inhibiting space charge-related effects in an ion source, an electron beam is directed into a chamber to produce ions from sample material in the chamber. A voltage pulse is applied to the chamber to perturb an electron space charge present in the chamber. The ion source may be an electron impact ionization (EI) apparatus. The ion source may operated in conjunction with a mass spectrometry system.
申请公布号 JP2008539549(A) 申请公布日期 2008.11.13
申请号 JP20080508867 申请日期 2006.03.31
申请人 发明人
分类号 H01J49/14;G01N27/62 主分类号 H01J49/14
代理机构 代理人
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