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发明名称
Aktiv gekühlte Verteilungsplatte zur Temperaturreduzierung der reaktiven Gase in einem Plasmabehandlungssystem
摘要
申请公布号
DE60131695(T2)
申请公布日期
2008.11.13
申请号
DE20016031695T
申请日期
2001.04.25
申请人
AXCELIS TECHNOLOGIES INC.
发明人
KINNARD, DAVID WILLIAM;RICHARDSON, DANIEL BRIAN
分类号
H01J37/32;H05H1/46;C23C16/44;C23C16/455;G03F7/42;H01L21/027;H01L21/302;H01L21/3065
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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