发明名称 |
IN-LINE VIRTUAL-MASKING METHOD FOR MASKLESS LITHOGRAPHY |
摘要 |
An inline virtual masking method for a maskless lithography is provided to prevent or reduce errors chemically generated with smudge and to realize the inline compensation of the deformation of a substrate without using a member for physical correction. An inline virtual masking method for a maskless lithography comprises an exposure hosting computer connection unit which produces and transmits a virtual mask for the exposure for the same pattern by inputting data necessary for the pattern exposure in a maskless lithographic process using micro-mirror; and a micro-mirror controller connection unit transmitting the beam of light to a micro-mirror controller by setting whether beam of light is reflected or not to micro-mirror with a virtual mask for the exposure, which it is transmitted from the exposure hosting computer connection unit. |
申请公布号 |
KR100868242(B1) |
申请公布日期 |
2008.11.12 |
申请号 |
KR20070046450 |
申请日期 |
2007.05.14 |
申请人 |
IAMTEN CO., LTD. |
发明人 |
SEO, MAN SEUNG;KIM, HAE RYUNG |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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