发明名称 METHOD FOR MANUFACTURING A NONVOLATILE MEMORY DEVICE
摘要 <p>The adhesive force between the doped polysilicon film and the doped polysilicon film can be increased by forming the doped polysilicon film on the upper side after doping a part of the top undoped polysilicon film is doped. A step is for preparing the substrate having undoped polysilicon film(102A). A step is for forming the impurity layer(105) including dopant on the un doped polysilicon film. A step is for diffusing the undoped having the impurity layer to the undoped polysilicon film. A step is for forming the doped polysilicon film having the same conductive type as the impurity layer on undoped polysilicon film.</p>
申请公布号 KR20080098912(A) 申请公布日期 2008.11.12
申请号 KR20070044307 申请日期 2007.05.07
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, BO YOUNG
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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