发明名称 |
COATING FILM FORMING DEVICE, USAGE OF COATING FILM FORMING DEVICE AND STORAGE MEDIUM |
摘要 |
<p>The coating film forming apparatus is provided to improve the cleaning capability of the peripheral edge of substrate to facilitate the maintenance and repair. The contamination of the transfer arm can be suppressed. The coating film forming apparatus comprises the spin chuck(11) installed within the outer cup(31); the inner cup(34) which is installed in order to surround the lower area of the substrate(W) held by the spin chuck. The coating film is formed by supplying the chemical solution in the central part of the substrate supported by the spin chuck and by rotating the wafer. The cleaning nozzle(21) can be attached and detached from a protrusion part, connecting with the cleansing liquid supply pipe(52). The peripheral edge of substrate is cleaned by supplying the cleaning solution in the rear peripheral part of the substrate in the state of mounting the protrusion part.</p> |
申请公布号 |
KR20080099150(A) |
申请公布日期 |
2008.11.12 |
申请号 |
KR20080041630 |
申请日期 |
2008.05.06 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
OGATA NOBUHIRO;INADA HIROICHI;YAMAMOTO TARO;FUJIMOTO AKIHIRO |
分类号 |
H01L21/027;B05D1/40;G03F7/16;H01L21/08 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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