| 摘要 |
<p>The substrate processing apparatus having the bake unit to the edge portion is provided to reduce the processing time for substrate transfer. The substrate processing apparatus of the in-line type processes using the photolithographic process of the glass substrate comprises an index(102), a process processing part(104), an exposure system. The process processing part comprises a plurality of process units(160a,160b,160c). The process unit comprises one or more bake units(110,120). The bake unit inserts a substrate in the first direction and draws a substrate in the second direction vertical to the first direction. The substrate processing apparatus has one or more bake unit in the edge portion of the process processing part near to the exposure system(130). The bake unit accesses the substrate in the vertical direction. The substrate processing apparatus processes the photolithographic process of the glass substrate.</p> |
