发明名称 Method for producing AlN single crystal and AlN single crystal
摘要 An AlN single crystal is grown by pressurizing a melt including at least gallium, aluminum and sodium in an atmosphere containing nitrogen. Preferably, the AlN single crystal is grown under a nitrogen partial pressure of 50 atms or lower and at a temperature in a range of 850° C. to 1200° C.
申请公布号 US7449064(B2) 申请公布日期 2008.11.11
申请号 US20070682385 申请日期 2007.03.06
申请人 NGK INSULATORS, LTD. 发明人 IWAI MAKOTO;IMAI KATSUHIRO
分类号 C30B11/02 主分类号 C30B11/02
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