发明名称 |
Semiconductor device |
摘要 |
The invention is directed to a method for manufacturing a field plate of a high voltage device. The field plate is located on a drift region of a substrate, wherein an isolation structure is located on the drift region. The method comprises steps of forming a first dielectric layer over the substrate and then forming a first patterned conductive layer on the first dielectric layer, wherein the first patterned conductive layer is located over the isolation structure and exposes a portion of a top surface of the first dielectric layer. The exposed portion of the first dielectric layer is removed until a top surface of the isolation structure so as to form a plurality of vertical fin-type dielectric bottoms.
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申请公布号 |
US7449748(B2) |
申请公布日期 |
2008.11.11 |
申请号 |
US20060306817 |
申请日期 |
2006.01.12 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
KAO CHING-HUNG;LIN CHIN-SHUN |
分类号 |
H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119 |
主分类号 |
H01L29/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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