发明名称 PROCESS FURNACE OR THE LIKE.
摘要 <p>A part of a CVI/CVD furnace, in which a heating system (22) for heating the furnace is located, is isolated from a remaining part of the furnace exposed to a reactive gas present therein. The shell of the furnace may for example be proided with a dividing wall (16) or the like to provide a physical separation. In addition, an inert gas such as argon or nitrogen is supplied through conduit (34) to the heating zone containing the heating system so that part of the furnace is at positive pressure differential compared to the part in which the reactive gas is present. As a result, the reactive gas is retarded from contacting the heating system which could, among other things, cause deposits to form thereon. More generally, the control of reactive gas flow in the furnace is better controlled.</p>
申请公布号 MX2008013643(A) 申请公布日期 2008.11.10
申请号 MX20080013643 申请日期 2007.04.24
申请人 MESSIER-BUGATTI. 发明人 LAURENT LANVIN;PHILIPPE JOUANNARD
分类号 C23C16/04;C23C16/46 主分类号 C23C16/04
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