发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing, with a high yield, a reliable semiconductor device that cannot be destroyed by pressure applied locally from outside. <P>SOLUTION: A semiconductor device is manufactured by forming an element substrate having a semiconductor element formed by a single-crystal semiconductor substrate or an SOI substrate, or a single-crystal substrate or an SOI substrate, providing the fibrous body of an organic or inorganic compound on the element substrate, applying a composition including an organic resin from the element substrate and the fibrous body, and forming a sealing layer, where the fibrous body of the organic or inorganic compound is impregnated with the organic resin, on the element substrate by heating. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008270762(A) 申请公布日期 2008.11.06
申请号 JP20080062132 申请日期 2008.03.12
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 MICHIMAE YOSHITAKA;SUGIYAMA EIJI;OTANI HISASHI;TSURUME TAKUYA
分类号 H01L21/56;G06K19/07;G06K19/077;H01L21/8247;H01L23/29;H01L23/31;H01L27/115;H01L29/786;H01L29/788;H01L29/792 主分类号 H01L21/56
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