发明名称 SYSTEM AND METHOD FOR MANAGING POWER SUPPLIED TO A PLASMA CHAMBER
摘要 A system and method for managing power delivered to a processing chamber is described. In one embodiment power is delivered to the processing chamber with a power cable, the power cable storing energy and including a first and second conductors, the first conductor having a first voltage polarity relative to the second conductor. The voltage polarity of the first conductor is reversed relative to the second conductor and at least a portion of the stored energy in the power cable is provided to the plasma chamber while the polarity of the first power cable is reversed.
申请公布号 WO2008033968(A3) 申请公布日期 2008.11.06
申请号 WO2007US78339 申请日期 2007.09.13
申请人 ADVANCED ENERGY INDUSTRIES, INC.;PANKRATZ, JOSH 发明人 PANKRATZ, JOSH
分类号 H01H9/50 主分类号 H01H9/50
代理机构 代理人
主权项
地址