发明名称 |
SYSTEM AND METHOD FOR MANAGING POWER SUPPLIED TO A PLASMA CHAMBER |
摘要 |
A system and method for managing power delivered to a processing chamber is described. In one embodiment power is delivered to the processing chamber with a power cable, the power cable storing energy and including a first and second conductors, the first conductor having a first voltage polarity relative to the second conductor. The voltage polarity of the first conductor is reversed relative to the second conductor and at least a portion of the stored energy in the power cable is provided to the plasma chamber while the polarity of the first power cable is reversed. |
申请公布号 |
WO2008033968(A3) |
申请公布日期 |
2008.11.06 |
申请号 |
WO2007US78339 |
申请日期 |
2007.09.13 |
申请人 |
ADVANCED ENERGY INDUSTRIES, INC.;PANKRATZ, JOSH |
发明人 |
PANKRATZ, JOSH |
分类号 |
H01H9/50 |
主分类号 |
H01H9/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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