发明名称 |
Kontaktvorrichtung und Verfahren zur Herstellung derselben |
摘要 |
Provided is a method for producing a contact device, including a step of forming a first conductive film; a step of forming a second conductive film containing a metal or an alloy of the metal on the first conductive film; a step of forming a third conductive film on the second conductive film; and a step of forming a surface layer on the third conductive film, the surface layer containing an oxidative product of the metal in the second conductive film, which metal has been diffused to be precipitated out from the surface of the third conductive film and oxidized. |
申请公布号 |
DE112007000210(T5) |
申请公布日期 |
2008.11.06 |
申请号 |
DE20071100210T |
申请日期 |
2007.01.19 |
申请人 |
ADVANTEST CORP. |
发明人 |
NAKAMURA, KIVOTO;ARIKAWA, HIROSHI;MORO, YOSHIAKI;SANPEI, HIROKAZU |
分类号 |
H01H11/04;B81C1/00;H01L21/28 |
主分类号 |
H01H11/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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