FIELD EFFECT TRANSISTOR HAVING GERMANIUM NANOROD AND METHOD OF MANUFACTURING THE SAME
摘要
<p>The field effect transistor and a manufacturing method thereof are provided to increase the driving speed and decrease the driving voltage by equipping the germanium nano-rods in which the mobility is bigger than the silicon as a channel. The field effect transistor(100) includes the gate oxide(130) formed on the substrate(110); germanium nano-rods(140) in which both ends are exposed; the source electrode(151) and the drain electrode(152) connected with the both ends of the germanium nano-rods; the gate electrode(160) formed on the gate oxide between the source electrode and drain electrode. The germanium nano-rods are embedded in the gate oxide.</p>
申请公布号
KR20080097762(A)
申请公布日期
2008.11.06
申请号
KR20070043025
申请日期
2007.05.03
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
MOON, CHANG WOOK;JEON JOONG S.;LEE, JUNG HYUN;LEE, NA EIN;PARK, YEON SIK;RHEE, HWA SUNG;LEE, HO;CHO SE YOUNG;KIM, SUK PIL