发明名称 FIELD EFFECT TRANSISTOR HAVING GERMANIUM NANOROD AND METHOD OF MANUFACTURING THE SAME
摘要 <p>The field effect transistor and a manufacturing method thereof are provided to increase the driving speed and decrease the driving voltage by equipping the germanium nano-rods in which the mobility is bigger than the silicon as a channel. The field effect transistor(100) includes the gate oxide(130) formed on the substrate(110); germanium nano-rods(140) in which both ends are exposed; the source electrode(151) and the drain electrode(152) connected with the both ends of the germanium nano-rods; the gate electrode(160) formed on the gate oxide between the source electrode and drain electrode. The germanium nano-rods are embedded in the gate oxide.</p>
申请公布号 KR20080097762(A) 申请公布日期 2008.11.06
申请号 KR20070043025 申请日期 2007.05.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 MOON, CHANG WOOK;JEON JOONG S.;LEE, JUNG HYUN;LEE, NA EIN;PARK, YEON SIK;RHEE, HWA SUNG;LEE, HO;CHO SE YOUNG;KIM, SUK PIL
分类号 H01L29/786 主分类号 H01L29/786
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