| 摘要 |
A system for preparing nanoparticles using non-thermal pulsed plasma is provided. The system comprises a reaction chamber having two divided regions, i.e. a first region where nanoparticles are to be formed and a second region where the nanoparticles are to be received, to prevent the formation of a thin film of nanoparticles in the second region. The use of the system enables the preparation of nanoparticles with improved uniformity and high collection efficiency. In addition, collection and deposition of nanoparticles can be simultaneously performed in the second region. Therefore, the system can find applications in various fields, including devices, secondary cells and sensors. Further provided is a method for preparing nanoparticles using the system.
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