发明名称 |
CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY |
摘要 |
A chemical vapor deposition apparatus for a flat display is provided to cool susceptor to the proper level in short time, thereby minimizing the work loss and maintenance time. A deposition process for a flat display panel is performed at a chamber(10). A susceptor(50) installed at the inside of the chamber to be ascended or descended loads the flat display. A cooling section(70) compulsorily cools the susceptor heated in the deposition process by cooling the exterior wall of the chamber and dropping the temperature of inside of the chamber. A chamber comprises an upper and a lower chambers. The upper chamber has an electrode for discharging the deposition material. The lower chamber connected to the upper chamber has the susceptor. |
申请公布号 |
KR20080097832(A) |
申请公布日期 |
2008.11.06 |
申请号 |
KR20070043177 |
申请日期 |
2007.05.03 |
申请人 |
SFA ENGINEERING CORP. |
发明人 |
LEE, SANG MUN;JANG, SANG LAE |
分类号 |
G02F1/13 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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