发明名称 CHEMICAL VAPOR DEPOSITION APPARATUS FOR FLAT DISPLAY
摘要 A chemical vapor deposition apparatus for a flat display is provided to cool susceptor to the proper level in short time, thereby minimizing the work loss and maintenance time. A deposition process for a flat display panel is performed at a chamber(10). A susceptor(50) installed at the inside of the chamber to be ascended or descended loads the flat display. A cooling section(70) compulsorily cools the susceptor heated in the deposition process by cooling the exterior wall of the chamber and dropping the temperature of inside of the chamber. A chamber comprises an upper and a lower chambers. The upper chamber has an electrode for discharging the deposition material. The lower chamber connected to the upper chamber has the susceptor.
申请公布号 KR20080097832(A) 申请公布日期 2008.11.06
申请号 KR20070043177 申请日期 2007.05.03
申请人 SFA ENGINEERING CORP. 发明人 LEE, SANG MUN;JANG, SANG LAE
分类号 G02F1/13 主分类号 G02F1/13
代理机构 代理人
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