| 摘要 |
<p>A near-field film-thickness measurement apparatus having a spatial resolution at or below the wavelength of light and having sufficient film-thickness measurement precision. The near-field film-thickness measurement apparatus 10 comprises a scattering near-field probe 12, a light source 14, a detector 18, a spectroscope 16 disposed in an optical path between the light source 14 and the detector 18, and a film-thickness calculating unit 20. The light source 14 emits excitation light for generating near-field light at a tip of the near-field probe 12 and/or at a surface of a film sample. The detector 18 detects, as measurement light, scattered light generated by bringing the tip of the near-field probe 12 and the surface of the film sample close to the region of the near-field light. The spectroscope 16 performs spectrometry in a predetermined range of wave numbers. The film-thickness calculating unit 20 calculates the film thickness of the film sample based on spectral information obtained from the measurement light detected at the detector 18.</p> |
