| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device capable of improving a cleaning effect with respect to a substrate to be processed, easily forming the liquid film of a cleaning liquid on the surface of the substrate to be processed, and suppressing the formation of a watermark on the substrate to be processed, and to provide a substrate cleaning method. SOLUTION: The substrate cleaning device 1 (2, 3) includes: a cleaning liquid supply part for supplying the cleaning liquid; a liquid drop generation gas supply part for supplying gas for generating liquid drops; a two fluid nozzle 20 for spraying the liquid drops of the cleaning liquid onto a part of the substrate W to be processed, which are generated by mixing the cleaning liquid to be supplied from the cleaning liquid supply part with the gas for generating the liquid drops, to be supplied from the liquid drop generation gas supply part; and a heating part 40 (60) for heating a part of the substrate W to be processed. The one part of the substrate W to be processed is heated by the heating part 40 (60) immediately before the two fluid nozzle 20 sprays the liquid drops of the cleaning liquid to the one part. COPYRIGHT: (C)2009,JPO&INPIT
|
