| 摘要 |
To provide a large sputtering target excellent in discharge characteristics during sputtering and in characteristics of a thin film thereby obtainable. Further, a process for producing a sintered body is provided, whereby a large green body excellent in shape accuracy can be obtained by means of cold isostatic pressing directly without preforming, and a sintered body capable of providing the above-mentioned excellent sputtering target, can be produced efficiently at a low cost. The sputtering target is produced by using a sintered body having the content of carbon contained as an impurity reduced to less than 0.005 wt %. Such a sintered body is obtainable by molding a raw material powder by cold isostatic pressing directly without adding a binder containing an organic substance or a molding aid, followed by firing. Further, it becomes possible to produce such a sintered body by using a molding die having such a construction that at the time of pressure compression, pressing is applied to a filled raw material powder only in a substantially uniaxial direction, and at the time of reducing the pressure after the completion of pressing, the pressure can be released substantially isotropically with respect to the green body. Further, a large target having the thickness of an erosion region made thick, can be easily produced in good yield, and efficiency in the use of the target can be improved.
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