| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is excellent in resolution and improves pattern collapse even in the formation of a fine pattern of ≤100 nm and a pattern forming method using the same, with respect to a positive photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit board of liquid crystal, thermal head and the like or in other photofabrication processes and a pattern forming method using the same. <P>SOLUTION: The positive photosensitive composition comprises (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (B) a resin which has a repeating unit having two ester groups in a side chain, and decomposes by the action of an acid to increase its solubility in an alkali developer. The pattern forming method using the same is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
