发明名称 FIELD-EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide an insulated gate type field-effect transistor preventing gate insulation breakdown resulted from a gate insulating film and characteristic degradation by hot carrier. SOLUTION: In a field-effect transistor whose gate electrode is insulated from a semiconductor substrate surface, gate air gap is provided at least between a gate electrode surface and the semiconductor substrate surface which is opposite to the gate electrode surface, and the gate air gap is filled with a gas. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008270641(A) 申请公布日期 2008.11.06
申请号 JP20070114034 申请日期 2007.04.24
申请人 ELPIDA MEMORY INC;HIROSHIMA UNIV 发明人 SUNAMI HIDEO;OYU SHIZUNORI;MIYAKE HIDEJI
分类号 H01L29/78 主分类号 H01L29/78
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