发明名称 WIRING SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要 A method for manufacturing a wiring substrate includes the steps of: (a) forming a sacrificial layer in a first pattern on a substrate; (b) forming a catalyst layer in a second pattern on the substrate; (c) immersing the substrate in an electroless plating liquid, thereby depositing a metal layer on the catalyst layer in the second pattern; and (d) heating to remove the sacrificial layer and to form a metal layer in a third pattern, wherein the third pattern is a region where the first pattern and the second pattern overlap each other.
申请公布号 US2008274338(A1) 申请公布日期 2008.11.06
申请号 US20080056959 申请日期 2008.03.27
申请人 SEIKO EPSON CORPORATION 发明人 KANEDA TOSHIHIKO;KIMURA SATOSHI;FURIHATA HIDEMICHI;AMAKO JUN;SAWAKI DAISUKE;KIJIMA TAKESHI
分类号 B32B15/02;B05D3/12 主分类号 B32B15/02
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