发明名称 |
CLAD TEXTURED METAL SUBSTRATE FOR FORMING EPITAXIAL THIN FILM AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and high strength, and a method for manufacturing the same. <P>SOLUTION: The clad textured metal substrate for forming the epitaxial thin film thereon comprises a metallic layer and a silver layer which is bonded to at least one face of the metallic layer. The silver layer has a ä100}<001> cube texture in which a deviating angleΔϕof a crystal axes satisfiesΔϕ≤9°. The oriented metal substrate can be manufactured by hot-working the silver sheet containing oxygen concentration of 30 to 200 ppm and heat-treating it for orientation, and bonding the metal sheet with the oriented silver sheet by using a surface activated bonding process. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2008266687(A) |
申请公布日期 |
2008.11.06 |
申请号 |
JP20070108607 |
申请日期 |
2007.04.17 |
申请人 |
CHUBU ELECTRIC POWER CO INC;TANAKA KIKINZOKU KOGYO KK |
发明人 |
KAJIMA NAOJI;NAGAYA SHIGEO;SHIMA KUNIHIRO;HOSHINO HIROSHI |
分类号 |
C22F1/14;B32B15/01;C22C5/06;C22F1/00;C22F1/02;C30B29/22;H01B12/06 |
主分类号 |
C22F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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