PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To prevent discharge in a gas introducing path for plasma excitation, in a microwave plasma processing apparatus. SOLUTION: In the plasma processing apparatus for processing a substrate to be processed, a space for plasma excitation and a plasma gas introducing path for the same are separated from each other by a porous medium such as a porous ceramic material, thereby: preventing the plasma excitation in the plasma introducing path; and exciting uniform plasma of high density in a desired plasma excitation space. COPYRIGHT: (C)2009,JPO&INPIT