发明名称 Device for Carbon Deposition
摘要 A method for carbon deposition using a pulsed, plasma-supported vacuum arc discharge, having an anode, a target cathode made of carbon, a pulsed energy source and at least two ignition units. The at least two ignition units are positioned in the edge area of target cathode and each have two planar metallic electrodes and a planar ceramic insulator positioned between the electrodes. The planar shape of ignition units and their positioning on target cathode enables homogeneous utilization of the entire target surface and homogeneous coating of workpieces.
申请公布号 US2008271998(A1) 申请公布日期 2008.11.06
申请号 US20050629972 申请日期 2005.04.26
申请人 ROBERT BOSCH GMBH 发明人 SCHNEIDER GUNTER;SCHATTKE ALEXANDER;FEUERFEIL RAINER
分类号 C23C14/00;C23C14/06;C23C14/32;H01J37/32;H05H1/48 主分类号 C23C14/00
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