EXTREME ULTRAVIOLET MICROSCOPE

摘要

An extreme ultraviolet (EUV) microscope configured to analyze a sample (5). The microscope includes a source (2) of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2 - 6 nm, and an optical system (3) constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating (6) from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in- phase reflection of at least a portion of the radiation in the range of about 2 - 6 nm.