| 摘要 |
<P>PROBLEM TO BE SOLVED: To facilitate a flow rate adjustment of a fluid flowing in an individual flow path in a structure in which fluids are flown into a plurality of flow paths disposed in parallel, respectively, thereby controlling a temperature of a plurality of units. <P>SOLUTION: An exposure apparatus comprises the plurality of units of which each temperature is to be controlled, and the plurality of units are functioned, whereas a pattern of an original plate is transferred to a board. The exposure apparatus comprises: a plurality of flow paths 132a to 132e which are arranged in parallel to each other, and through which the fluids for controlling a temperature of the plurality of units are flown, respectively; a bypass line 133 arranged in parallel to the plurality of flow paths so as to bypass the plurality of flow paths; and a flow rate controller for controlling a flow rate of the fluid flowing in the bypass line so that a total flow rate of the fluid flowing in the plurality of flow paths and the bypass line becomes a target flow rate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
