发明名称 GaN-BASED LIGHT EMITTING DIODE ELEMENT AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a GaN-based light emitting diode element constituted by forming an LED structure comprising a GaN-based semiconductor on a surface of a semiconductor, while forming irregularities desirable for the purpose of improving light extraction efficiency on the surface of the substrate. <P>SOLUTION: The GaN-based light emitting diode element 10 includes the substrate 11 and the GaN-based semiconductor 12. A region 11A in which the irregularities capable of scattering the light are formed is partially provided to the surface of the substrate 11. The GaN-based semiconductor 12 includes a GaN system semiconductor crystal film which has laterally grown from a region 11B where no irregularity is formed on the surface of the substrate 11 to the region 11A where the irregularities are formed. In a desirable manufacturing method, a part of the surface of the substrate having a mirror-polished surface is etched to form the irregularities capable of scattering the light, and the GaN-based semiconductor crystal film is laterally grown from the region where no irregularity is formed to the region where the irregularities are formed. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008270689(A) 申请公布日期 2008.11.06
申请号 JP20070115334 申请日期 2007.04.25
申请人 MITSUBISHI CHEMICALS CORP 发明人 KUDO HIROMITSU;NAKAI TERUHISA;OKAGAWA HIROAKI
分类号 H01L33/10;H01L33/22;H01L33/32 主分类号 H01L33/10
代理机构 代理人
主权项
地址