发明名称 |
GaN-BASED LIGHT EMITTING DIODE ELEMENT AND MANUFACTURING METHOD THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a GaN-based light emitting diode element constituted by forming an LED structure comprising a GaN-based semiconductor on a surface of a semiconductor, while forming irregularities desirable for the purpose of improving light extraction efficiency on the surface of the substrate. <P>SOLUTION: The GaN-based light emitting diode element 10 includes the substrate 11 and the GaN-based semiconductor 12. A region 11A in which the irregularities capable of scattering the light are formed is partially provided to the surface of the substrate 11. The GaN-based semiconductor 12 includes a GaN system semiconductor crystal film which has laterally grown from a region 11B where no irregularity is formed on the surface of the substrate 11 to the region 11A where the irregularities are formed. In a desirable manufacturing method, a part of the surface of the substrate having a mirror-polished surface is etched to form the irregularities capable of scattering the light, and the GaN-based semiconductor crystal film is laterally grown from the region where no irregularity is formed to the region where the irregularities are formed. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008270689(A) |
申请公布日期 |
2008.11.06 |
申请号 |
JP20070115334 |
申请日期 |
2007.04.25 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
KUDO HIROMITSU;NAKAI TERUHISA;OKAGAWA HIROAKI |
分类号 |
H01L33/10;H01L33/22;H01L33/32 |
主分类号 |
H01L33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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